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16-Mercaptohexadecanoic acid - 90%, high purity , CAS No.69839-68-5

  • ≥90%
Item Number
M433346
Grouped product items
SKUSizeAvailabilityPrice Qty
M433346-1g
1g
Available within 8-12 weeks(?)
Production requires sourcing of materials. We appreciate your patience and understanding.
$355.90
M433346-5g
5g
Available within 8-12 weeks(?)
Production requires sourcing of materials. We appreciate your patience and understanding.
$1,120.90
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Basic Description

Synonyms16-Mercaptohexadecanoic acid|69839-68-5|16-sulfanylhexadecanoic acid|MHDA|Hexadecanoic acid, 16-mercapto-|SCHEMBL49347|C16H32O2S|DTXSID00393287|INOAASCWQMFJQA-UHFFFAOYSA-N|AMY37962|16-Mercaptohexadecanoic acid, 90%|16-Mercaptohexadecanoic acid, 99%|MFCD00
Specifications & Purity90%
Product Description

16-Mercaptohexadecanoic acid (MHA) is a long chained alkanethiol which forms self-assembled monolayers (SAMs) on a variety of surfaces.


Application

MHA forms SAMs on gold dipyramids which can be used in the fabrication of nanoresonators for shell-isolated nanoparticle enhanced raman spectroscopy (SHINERS). It can also be used to surface modify gold electrodes that can be used for sensitive detection of clozapine. Gold surfaces can be self-assembled with MHA by polymer pen lithography (PPL) which can be potentially used in bioengineering.

Names and Identifiers

IUPAC Name 16-sulfanylhexadecanoic acid
INCHI InChI=1S/C16H32O2S/c17-16(18)14-12-10-8-6-4-2-1-3-5-7-9-11-13-15-19/h19H,1-15H2,(H,17,18)
InChi Key INOAASCWQMFJQA-UHFFFAOYSA-N
Canonical SMILES C(CCCCCCCC(=O)O)CCCCCCCS
Isomeric SMILES C(CCCCCCCC(=O)O)CCCCCCCS
WGK Germany 3
PubChem CID 3522585
Molecular Weight 288.49

Certificates

Certificate of Analysis(COA)

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Chemical and Physical Properties

Flash Point(°C)208.8℃
Boil Point(°C)421.7℃at 760 mmHg
Melt Point(°C)65-69 °C

Safety and Hazards(GHS)

Hazard Statements

H413:May cause long lasting harmful effects to aquatic life

WGK Germany 3
RIDADR NONHforallmodesoftransport

Related Documents

 SDS

 Specification Sheet

References

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2. Monica L Ohnsorg,Christopher K Beaudoin,Mary E Anderson.  (2015-05-29)  Fundamentals of MOF Thin Film Growth via Liquid-Phase Epitaxy: Investigating the Initiation of Deposition and the Influence of Temperature..  Langmuir : the ACS journal of surfaces and colloids,  31  ((22)): (6114-6121).  [PMID:26020573]
3. Wei Zhao,Jin Luo,Shiyao Shan,Jack P Lombardi,Yvonne Xu,Kelly Cartwright,Susan Lu,Mark Poliks,Chuan-Jian Zhong.  (2015-06-04)  Nanoparticle-Structured Highly Sensitive and Anisotropic Gauge Sensors..  Small (Weinheim an der Bergstrasse, Germany),  11  ((35)): (4509-4516).  [PMID:26037089]
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5. Jenny K Hedlund,Amy V Walker.  (2019-05-10)  Polytype control of MoS2 using chemical bath deposition..  The Journal of chemical physics,  150  ((17)): (174701-174701).  [PMID:31067898]
6. Jairo Pinto Oliveira,Adilson Ribeiro Prado,Wanderson Juvencio Keijok,Paulo Wagnner Pereira Antunes,Enrique Ronald Yapuchura,Marco Cesar Cunegundes Guimarães.  (2019-09-27)  Impact of conjugation strategies for targeting of antibodies in gold nanoparticles for ultrasensitive detection of 17β-estradiol..  Scientific reports,  9  ((1)): (13859-13859).  [PMID:31554912]
7. Riccardo Marin,José Lifante,Lucas V Besteiro,Zhiming Wang,Alexander O Govorov,Fernando Rivero,Fernando Alfonso,Francisco Sanz-Rodríguez,Daniel Jaque.  (2020-01-25)  Plasmonic Copper Sulfide Nanoparticles Enable Dark Contrast in Optical Coherence Tomography..  Advanced healthcare materials,  9  ((5)): (e1901627-e1901627).  [PMID:31977166]
8. Tatiana Parra Vello,Mathias Strauss,Carlos Alberto Rodrigues Costa,Cátia Crispilho Corrêa,Carlos César Bof Bufon.  (2020-02-29)  Deterministic control of surface mounted metal-organic framework growth orientation on metallic and insulating surfaces..  Physical chemistry chemical physics : PCCP,  22  ((10)): (5839-5846).  [PMID:32107524]
9. Landon J Brower,Lauren K Gentry,Amanda L Napier,Mary E Anderson.  (2017-11-29)  Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth..  Beilstein journal of nanotechnology,  8  (2307-2314).  [PMID:29181287]
10. Andreas Mark,Nicolas Helfricht,Astrid Rauh,Matthias Karg,Georg Papastavrou.  (2019-09-24)  The Next Generation of Colloidal Probes: A Universal Approach for Soft and Ultra-Small Particles..  Small (Weinheim an der Bergstrasse, Germany),  15  ((43)): (e1902976-e1902976).  [PMID:31544313]

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