High-Purity Metals & Alloys

• ≥99.5% metals basis
• ＜200nm

• ≥97%
• 10mg/ml in n-Hexane solution

• 2.5mg/ml

• Copper content 1-3%

Cas#:53801-63-1

• ≥99.5%
• diameter:90nm length:50μm, solvent:20ml ethanol,solute: 100 mg,Concentration:5mg/mL

• 0.7±0.03mg/L

Cas#:7439-89-6(water)

• 30 nm diameter, Amino functionalized,＞0.75 A520 Units/ml in citrate buffer

• 10 nm diameter,carboxylic functionalized,＞0.75 A520 Units/ml in citrate buffer

• ≥99.5%
• diameter:90nm length: 100μm, solvent:20ml ethanol,solute: 100 mg,Concentration:5mg/mL

• ≥99.5%
• Diameter: 120nm;length: 45μm, solvent:20ml ethanol,solute: 100 mg,Concentration:5mg/mL

• Concentration: 0.1 mg/ml, diameter: 15 nm

• Concentration: 0.1 mg/ml, diameter: 50 nm

• Concentration: 0.1 mg/ml, diameter: 80 nm

• ≥99.5%
• Diameter:200nm,length:50μm,Solvent: 20ml water,solute: 100 mg,Concentration:5mg/mL

• ≥99.5%
• diameter:70nm length:45μm, solvent:20ml ethanol,solute: 100 mg,Concentration:5mg/mL

• 10 nm diameter,Cyanuric acid functionalized,＞0.75 A520 Units/ml in citrate buffer