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High speed bright copper electroplating solution - semiconductor grade, high purity

Item Number
H475915
Grouped product items
SKUSizeAvailabilityPrice Qty
H475915-100ml
100ml
Available within 8-12 weeks(?)
Production requires sourcing of materials. We appreciate your patience and understanding.
$66.90
View related series
Electronic Chemicals & Etchants

Basic Description

Specifications & Puritysemiconductor grade
Product Description

High speed bright copper electroplating solution is an electrolytic acid copper process engineered for plating copper bumps, pads, patterns and redistribution layers as well as filling vials and trenches on wide varieties of substrates including semiconductors, glass, polymers et al. This copper electroplating solution is made up of cupric sulphate and sulphuric acid with small additions of hydrochloric acid and organic additives. The organic additives have a wide concentration process window eliminating the need for separate additive solutions and replenishment for about 120 Amp-hours of electroplating.

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Related Documents

Solution Calculators