Tetrakis(ethylmethylamido)hafnium(IV) - packaged for use in deposition systems, high purity , CAS No.352535-01-4

  • packaged for use in deposition systems
Item Number
T432653
Grouped product items
SKUSizeAvailabilityPrice Qty
T432653-10g
10g
Available within 8-12 weeks(?)
Production requires sourcing of materials. We appreciate your patience and understanding.
$3,094.90

Basic Description

SynonymsTetrakis(ethylmethylamido)hafnium(IV), packaged for use in deposition systems | SCHEMBL237323 | Tetrakis(ethylmethylamido)hafnium(IV) | Hafnium tetrakis(ethylmethylamide) | Tetrakis(ethylmethylamino)hafnium 99.999% | MFCD03427130 | Tetrakis(ethylmethylami
Specifications & Puritypackaged for use in deposition systems
Storage TempStore at 2-8°C
Shipped InWet ice
Product Description

General Description

Atomic number of base material: 72 Hafnium


Application

Precursors Packaged for Depositions Systems

Names and Identifiers

IUPAC Name ethyl(methyl)azanide;hafnium(4+)
INCHI InChI=1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
InChi Key NPEOKFBCHNGLJD-UHFFFAOYSA-N
Canonical SMILES CC[N-]C.CC[N-]C.CC[N-]C.CC[N-]C.[Hf+4]
Isomeric SMILES CC[N-]C.CC[N-]C.CC[N-]C.CC[N-]C.[Hf+4]
PubChem CID 4103752
UN Number 3398

Certificates

Certificate of Analysis(COA)

Enter Lot Number to search for COA:

Chemical and Physical Properties

Flash Point(°F)52 °F
Flash Point(°C)11 °C - closed cup
Boil Point(°C)78 °C
Melt Point(°C)<-50 °C

Safety and Hazards(GHS)

Pictogram(s) GHS06,   GHS05,   GHS07,   GHS02
Signal Danger
Hazard Statements

H315:Causes skin irritation

H319:Causes serious eye irritation

H335:May cause respiratory irritation

H311:Toxic in contact with skin

H331:Toxic if inhaled

H314:Causes severe skin burns and eye damage

H302:Harmful if swallowed

H225:Highly Flammable liquid and vapor

H261:In contact with water releases flammable gas

Precautionary Statements

P261:Avoid breathing dust/fume/gas/mist/vapors/spray.

P305+P351+P338:IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses if present and easy to do - continue rinsing.

P280:Wear protective gloves/protective clothing/eye protection/face protection.

P231+P232:Handle under inert gas/... Protect from moisture.

P370+P378:In case of fire: Use ... to extinguish.

P210:Keep away from heat, hot surface, sparks, open flames and other ignition sources. - No smoking.

P302+P352:IF ON SKIN: wash with plenty of water.

P321:Specific treatment (see ... on this label).

P405:Store locked up.

P501:Dispose of contents/container to ...

P233:Keep container tightly closed.

P240:Ground/bond container and receiving equipment.

P264:Wash hands [and …] thoroughly after handling.

P403+P235:Store in a well-ventilated place. Keep cool.

P260:Do not breathe dust/fume/gas/mist/vapors/spray.

P303+P361+P353:IF ON SKIN (or hair): Take off Immediately all contaminated clothing. Rinse SKIN with water [or shower].

P271:Use only outdoors or in a well-ventilated area.

P241:Use explosion-proof [electrical/ventilating/lighting/.../] equipment.

P270:Do not eat, drink or smoke when using this product.

P301+P330+P331:IF SWALLOWED: Rinse mouth. Do NOT induce vomiting.

P304+P340:IF INHALED: Remove person to fresh air and keep comfortable for breathing.

P363:Wash contaminated clothing before reuse.

P403+P233:Store in a well-ventilated place. Keep container tightly closed.

P362+P364:Take off contaminated clothing and wash it before reuse.

P330:Rinse mouth.

P402+P404:Store in a dry place. Store in a closed container.

P242:Use only non-sparking tools.

P243:Take precautionary measures against static discharge.

P361+P364:Take off immediately all contaminated clothing and wash it before reuse.

P264+P265:Wash hands [and …] thoroughly after handling. Do not touch eyes.

P301+P317:IF SWALLOWED: Get medical help.

P305+P354+P338:IF IN EYES: Immediately rinse with water for several minutes. Remove contact lenses if present and easy to do. Continue rinsing.

RIDADR UN3398 - DOT UN3399 class 4.3 - PG 1 - Organometallic substance, liquid, water-reactive, HI: all (not BR)

Related Documents

References

1. Martin Rose, Jaakko Niinistö, Ingolf Endler, Johann W Bartha, Peter Kücher, Mikko Ritala,.  (2010-04-02)  In situ reaction mechanism studies on ozone-based atomic layer deposition of Al(2)O(3) and HfO(2)..  ACS applied materials & interfaces,  ((2)): ( 347-350 ).  [PMID:20356179]

Solution Calculators